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NSL Usermeeting 2015

Friday, 24 July 2015

 

 

10:00 Introduction - Otto-Lehmann Lecture Hall (building 30.22)
   
  G. Goll                Annual cleanroom introduction (mandatory for all users of the NSL cleanroom)
   
11:00 Workshop: E-Beam Lithography - Otto-Lehmann Lecture Hall (building 30.22)
   
  S. Diewald          Proximity correction for e-beam exposures
   
  Discussion of user questions and demands
  We encourage user presentations (5-10 min), and welcome any discussions on applications, specific issue solutions, and feature needs or requirements.
   


Karlsruhe, 22.07.2015 G. Goll

NSL Usermeeting 2014

Wednesday, 23 July 2014

 

 

14:00 Introduction - MTI Lecture Hall (building 30.33)
   
  G. Goll                Annual cleanroom introduction (mandatory for all users of the NSL cleanroom)
   
15:15 Workshop 1: E-Beam Lithography - Seminar Room 3-1 (building 30.23)
   
  Coffee break
   
15:30 S. Diewald          Proximity correction for e-beam exposures
15:50 Discussion of user questions and demands
   
15:15 Workshop 2: Reactive Ion Etching - Seminar Room 104 (building 30.25)
   
  Coffee break
   
15:30 G. Goll               Basic aspects of reactive ion etching
15:50 Discussion of user questions and demands


Following the workshops, you have the opportunity for a social gathering in form of a barbecue behind the CFN building.


Karlsruhe, 22.07.2014 G. Goll

NSL Usermeeting 2013

Tuesday, 23 July 2013
Otto-Lehmann Lecture Hall

 

 

14:00     G.Goll Annual cleanroom introduction
(mandatory for all users of the NSL cleanroom)
   

 

Focused Session: Optical Lithography at NSL

14:45 M. Hermatschweiler,
Nanoscribe GmbH

3D μ-Printing by Direct Laser Writing

15:15 B. Richter, ZI Three-Dimensional microscaffolds exhibiting
spatially resolved surface chemistry
15:45 N. Lindenmann, IPQ Broadband low-loss interconnects enabled by photonic wire bonding
16:15 coffee break  
16:45 S. Meißner/J. Braumüller, PI     Optical lithography for superconducting qubits
17:15 A. Vetter, CFN Investigation of resist systems for optimized lift-off
processes


Following the presentations, you have the opportunity for a social gathering in form of a barbecue behind the CFN building.


Karlsruhe, 09.07.2013 G. Goll

Usermeeting 2012

Tuesday, 24. July 2012
Otto-Lehmann Lecture Hall

 

 

14:00     G. Goll, CFN Annual introduction in the use of the cleanroom.
(Mandatory for all user of the NSL cleanroom)
   
Key subject: Electron-beam lithography at KIT
14:45 S. Diewald, CFN Electron-beam lithography at NSL – JEOL JBX-5500ZD
15:15 H. Rotzinger, PI     Fabrication of superconducting nano-electronics
15:45   Coffee Break
16:15 P. Jakob, IMT Basic knowledge for new users of the ebeam, focusing on the aspect of direct write
16:45 R. Palmer, IPQ Novel fabrication method for low loss silicon nano-wire waveguides and fibers couplers
17:15 K. Il’in, IMS Superconducting nanowire single-photon detector: towards high efficiency in infrared spectral range
17:45 W. Pernice, INT Integrated circuits for nano- and quantum photonics


Following the presentations, you have the opportunity for a social gathering in form of a barbecue behind the CFN building. Please bring your own grill food, drinks will be available at cost price.

Karlsruhe, 05.07.2012

G. Goll